ICVI Coatings
Our coatings, which are applied by ICVI (Isothermal Chemical Vapour Infiltration), are improving different properties of substrate materials like graphite, CFC, carbon-carbon, sintered silicon carbide, ridgid board etc.
Due to the fact that our coatings are infiltrated and not just deposed, unlike as with the more common CVD (Chemical Vapour Deposition) process, the adherence to the substrate is strongly improved.
This avoids microcracking and subsequent off-peeling of the coating. We infiltrate with 2 materials:
AGI-SIC
Extremely pure Silicon Carbide infiltration at low pressure and temperature gives the substrate very special properties in regards to oxidation resistance, tightness, abrasion, toughness, mechanical properties, thermal stability and low dilatation, high thermal conductivity. In addition, the depot is very homogeneous and is capable of non-deposition on selected areas. As the temperature and pressure during the process is low, the internal stress is minimal.
Typical applications are:
- Optical mirrors requesting high stability
- MOCVD wafer susceptors
- Diffusion furnace paddles and wafer carry boat
Another important specific of this process is that it can handle parts with length up to 2500 mm and diameters to 2500 mm.
Pyrolitic Carbon is infiltred at low pressure and temperature. Substrates can ve various materials and the properties of these can be changed. Densification of porous structures and sealing off porous surfaces are the main applications. An improvement of mechanical properties, reflectvity, chemical resistance, zero particle emmission.
Applications in the semiconductor industry are:
- Wafer trays for plasma CVD furnaces
- Boats for liquid phase epitaxy
- Boats and other parts for vapor deposition of III-V compounds such as GaAs
This process is also capable to handle parts up to 2500 x 2500 mm.